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Used Plasma Etcher / Asher

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Single Process Chamber with SLR (Shuttle Lock Transfer) Load Lock Manual Load with Load Lock Handling Currentl Location : AMERICA North (USA-Canada-Mexico)

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BRANSON/IPC S2005-11020 Reactor Center with 10” (i.d.) X 20” (h) Quartz Chamber S2000C Controller with 2ea Rot Location : AMERICA North (USA-Canada-Mexico)

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VOLT: 120 HZ: 50/60 USEE 8127 CRATE SIZE: 48X48X42 CRATE WEIGHT: 150 Location : AMERICA North (USA-Canada-Mexico)

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SERIAL: 103002 CHAMBER SIZE: 16" X 32" X 20" VOLT: 120 AMP: 30 HZ: 60 Location : AMERICA North (USA-Canada-Mexico)

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ICP Etcher (4) Chamber Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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ICP Etcher (1) Chamber Year(s) : 2008 Location : AMERICA North (USA-Canada-Mexico)

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Wetbench Location : AMERICA North (USA-Canada-Mexico)

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ICP Etcher (2) Chamber ICP Etch Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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SAT211 Photoresist Gold Acid Spray Etch Location : AMERICA North (USA-Canada-Mexico)

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200mm, s/n: NA Tool ID: CBSC*01 Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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Centura TPCC XE+ RP AB: Gate-ox (DPN+RTO);C:Singen Spacer Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier TEL Model TEL ALPHA 8S Vi Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)

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Ion Milling System with Magnetron Sputtering Cathode. Research grade Ion milling system with a single Ion gun Location : AMERICA North (USA-Canada-Mexico)

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WAFER SIZE 8,12 4 Chambers Year(s) : 2007 Location : EUROPE (Western and Northern)

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WAFER SIZE 8,12 1 chamber Year(s) : 2006 Location : EUROPE (Western and Northern)

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Tool ID DFN-01 Tool Status Connected Wafer Size 200 mm Fab Section Diffusion General Product Information Vend Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)

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Tool ID POCL3-01 Tool Status Connected Wafer Size 200 mm Fab Section Diffusion General Product Information Ve Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)

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Tool ID BDOPE-01 Tool Status Connected Wafer Size 200 mm Fab Section Diffusion General Product Information Ve Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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Plasma Processing Equipment and Tools Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)

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OXIDE ETCHER Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)

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Last knows condition: operational, one analog I/O box is not working. Application: deep silicon etch Substrat Year(s) : 1998 Location : EUROPE (Western and Northern)

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Last knows condition: operational, GUI PC and CTC PC in e-rack are not working. Application: deep silicon etc Year(s) : 2012 Location : EUROPE (Western and Northern)

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Applied Materials Precision 5000 (AMAT P5000) cluster tool and all spare parts. 4-inch/100mm wafer kit, pump Location : EUROPE (Western and Northern)

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Vertical Furnace (PYRO OXIDE) Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)

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Vertical Furnace (PYRO OXIDE) 200mm Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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