Used Plasma Etcher / Asher
473 resultsPlacement Machine Model: NXTIIC M6 DOM: 2014 Year(s) : 2014 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier TOKYO ELECTRON LTD Model U2E-8 Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Etch General Product Information Vendor Supplier LAM Model 2300 Exelan Flex Vin Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier Tokyo Electron Limited Mo Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier AME Model AMAT 5200 Centura 1 Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier Tokyo Electron Limited Mo Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEtcher/Oxide/4ch Year(s) : 1997 Location : ASIA (North East)
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More detailsLAM Rainbow TCP 9600SE II standalone with DSQ - Plasma Etch Vintage: 2005+/-5j Wafersize: 150mm 200mm convert Year(s) : 2005 Location : EUROPE (Western and Northern)
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More detailsLam Research 490 Polyimide plasma etcher Fully Rebuilt by Aspect systems. Â 6 gas inputs. ENI OEM6-XL power su Location : EUROPE (Western and Northern)
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More detailsdry: Si etcher Year(s) : 2001 Location : ASIA (North East)
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More detailsDry: ICP Etcher/4in Location : ASIA (North East)
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More detailsWafer Size 300 mm Fab Section Thin Film General Product Information Vendor Supplier UNAXIS Model Oerlikon Una Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier TOKYO ELECTRON LIMITED Mo Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)
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More detailsPrecision Etching/Coating System Year(s) : 2001 Location : ASIA (North East)
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More detailsPlasma Processing Equipment and Tools 200mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
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More details200mm, s/n: 310108 Plasma Processing Equipment and Tools Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
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More detailsHöllmüller Acid Etches Location : EUROPE (Western and Northern)
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More detailsHöllmüller Acid Etch YOM 2001 Year(s) : 2001 Location : EUROPE (Western and Northern)
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More detailsWafer Size Range Set Size 300 mm Condition Good Power Requirements Other V 75.0 A 50/60 Hz 3 Year(s) : 2012 Location : EUROPE (Western and Northern)
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More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier AME Model Centura Etch, IPS Vi Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier Applied Materials Model Centur Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Thin Film Tool Available Date 2024-10-31 General Product Information Vendor Sup Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier Tokyo Electron Limited Mo Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Etch General Product Information Vendor Supplier AXCELIS Model AXCELIS INTEGRA Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDry Etch/6in Location : ASIA (North East)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.