Used Plasma Etcher / Asher
473 resultsCANON MAS801HR Asher 150309- K1-051 yr 1992 Location : ASIA (North East)
Price : On request
More detailsANELVA ILC-1060 Sputter 170217-002 Location : ASIA (North East)
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More detailsCANON MAS801 Asher 150309-K1-034 Location : ASIA (North East)
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More detailsTEL Unity85DM Dry Etcher VINTAGE 1996 SPECSiO Etch、Gas:C4F8/CHF3/CF4/O2/Ar MU300X-006 CH1-CP-D7 TMP ET600WS/E Location : ASIA (North East)
Price : On request
More detailsTEL TE8600P Dry Etcher VINTAGE 1996 SF6 Ar O2 He N2 WORK SIZE 8" Location : ASIA (North East)
Price : On request
More detailsTEL TE-8500S Dry Etcher 110210-006 CF4 Ar CHF3 He N2 year 1994 Location : ASIA (North East)
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More details- Plasma etch chamber - cassette to cassette, single wafer, silicon dioxide etch system with diode chamber - 2 Year(s) : 1995 Location : EUROPE (Western and Northern)
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More details- 2x high density reflected electron (HRe) process chambers with cold cathode gauges - 2x dual channel tempera Year(s) : 1995 Location : EUROPE (Western and Northern)
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More details- Wafer size: 150mm - 2x Asyst LPT2150 SMIF interface - Ultra high vacuum Endura HP platform feat. High-speed- Year(s) : 1998 Location : EUROPE (Western and Northern)
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More detailsFirst machine with serial number 50xx - Mark II mainframe containing load lock chamber with cassette to casset Year(s) : 1998 Location : EUROPE (Western and Northern)
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More detailsRF Plasma barrel etcher Location : EUROPE (Western and Northern)
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More details790 Series Reactive Ion Etching / Plasma Enhanced System RIE Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier Applied Materials Model 200mm Year(s) : 1999 Location : United States (USA)
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More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier Tokyo Electron Limited Mo Year(s) : 1996 Location : United States (USA)
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More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier TOKYO ELECTRON LTD Model U2E-8 Year(s) : 1997 Location : United States (USA)
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More detailsWafer Size 300 mm Fab Section Etch General Product Information Vendor Supplier LAM Model 2300 Exelan Flex Vin Year(s) : 2006 Location : United States (USA)
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More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier Tokyo Electron Limited Mo Year(s) : 1996 Location : United States (USA)
Price : On request
More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier AME Model AMAT 5200 Centura 1 Year(s) : 1999 Location : United States (USA)
Price : On request
More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier Tokyo Electron Limited Mo Year(s) : 1996 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Thin Film General Product Information Vendor Supplier UNAXIS Model Oerlikon Una Year(s) : 2006 Location : United States (USA)
Price : On request
More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier TOKYO ELECTRON LIMITED Mo Year(s) : 2004 Location : United States (USA)
Price : On request
More detailsPlasma Processing Equipment and Tools 200mm Year(s) : 2000 Location : United States (USA)
Price : On request
More details200mm, s/n: 310108 Plasma Processing Equipment and Tools Year(s) : 1998 Location : United States (USA)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.