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2 AMAT, Applied Materials Precision 5000 Mark II

Ref : 280421-9-W
Condition : Used
Manufacturer : AMAT, Applied Materials
Model : Precision 5000 Mark II
Year(s) : 1998
Quantity : 2
Location : Seller or machines location:
EUROPE (Western and Northern)
Last check : 24 May. 2011

First machine with serial number 50xx
- Mark II mainframe containing load lock chamber with cassette to cassette wafer handling, VME system controller with hard disk and floppy disk storage, 28 line compatible on-board gas panel, bolt down load lock chamber lid and load lock purge system.
- Microprocessor controller including SRT display, self diagnostics, host computer interface via RS232 port SECS II protocol
- Standard floppy and hard disc (170NMB) storage
- Two etch chambers system – both with 6” MxP oxide etch process kit
- Including 750Watt generator process kit, hardware gas distribution plate and MFC controller gas line per chamber
- 6” oxide etch process kit
- Through the wall system
- Remote package including RF power supplies, 1x heat exchanger AMAT 0 , Neslab recirculator HX150 is missing, main AC box and other facilities
- Gaspanel for: CHF3, CF4, Ar, O2

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Second machine with serial number 58xx
- Mark II mainframe containing load lock chamber with cassette to cassette wafer handling, VME system controller with hard disk and floppy disk storage, 28 line compatible on-board gas panel, bolt down load lock chamber lid and load lock purge system.
- Microprocessor controller including CRT display, self diagnostics, host computer interface via RS232 port SECS II protocol
- Two metal etch chambers and two strip chambers system
 Chamber A: 6” clamped metal etch process kit (actually there is a cooling water leak externally which can be repaired).
 Chamber B: 6” clamped metal etch process kit
 Chambers C+D: 6” advanced strip and passivation chamber
- Including 1200Watt generator process kit, hardware gas distribution plate and MFC controller gas line per chamber
- 6” metal etch process kit with:
 AL etch ceramic fingered basic kit
 0.95” fingered ceramic focus ring
 Tapered head SiC DC Pick-ups
 Unilid gas distribution plate – 119holes
- 6” advanced strip and passivation chamber process kit basket style wafer support
- Through the wall system
- Gaspanel A&B: BCL3, Cl2, CF4, N2, SF6 / C: O2, N2, H2O
- 1x Neslab HX150 present and 1x is missing
- 1x Heat Exchanger AMAT 1 and 1x Heat Exchanger AMAT0

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