Used Lithography & Photoresist
196 resultsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model LITHIUS Vinta Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model XT1400E Vint Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier ASML Model XT1900Gi Vin Year(s) : 2008 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model LITHIUS Vinta Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model LITHIUS Vinta Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLithography Equipment 300mm Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details300mm, s/n: 0030 Lithography Equipment Year(s) : 2017 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Lithography General Product Information Vendor Supplier TOKYO ELECTRON LIMITED Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFUSION 150/7D Wafer Size Range Minimum 150 mm Maximum 200 mm Set Size 200 mm Die Anlage war bis zur Deins Year(s) : 1995 Location : EUROPE (Western and Northern)
Price : On request
More detailsStepper Manufacturer Ultratech Model UT1500 Year(s) : 1996 Location : EUROPE (Western and Northern)
Price : On request
More detailsDe-installation complete by Nikon Tech and currently located in environmentally controlled warehouse. No miss Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsDeveloper with 3 Developer Units, 9 Hotplates and 4 Coolplates. Very good condition Power Requirements 220 V Year(s) : 2001 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size 300 mm Fab Section Metrology General Product Information Vendor Supplier KLA Model Archer A500 LCM Year(s) : 2014 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section Metrology General Product Information Vendor Supplier KLA Model Archer A500 LCM Year(s) : 2014 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 300 mm Fab Section CMP General Product Information Vendor Supplier AMAT Model Raider-ECD-12 (RE10F Year(s) : 2013 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDual Track Photoresist Coater With Hotplates Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details300mm, s/n: V120377 Manual Photoresist Coaters Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsManual Photoresist Coaters 300mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsManual Photoresist Coaters 300mm Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotoresist Coaters 300mm, s/n: N100355 Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsManual Photoresist Coaters 300mm, s/n: Z111638 Year(s) : 2021 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLithography Equipment 300mm, s/n: SN6028 Year(s) : 2013 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLithography Equipment Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 200 mm Fab Section Lithography General Product Information Vendor Supplier TEL Model ACT8 Vintage Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier GASONICS INTERNATIONAL Model P Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Lithography & Photoresist on Wotol
The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,
The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000, PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U, M150PC, BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640, MJB-55,
HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.