Used Lithography & Photoresist
176 resultsTEL Lithius Coater Developer for Sale in Europe Its currently running wafers, complete and working condition Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsLITV25-01 Scanner Laser is working Further details in attachments Year(s) : 2002 Location : EUROPE (Western and Northern)
Price : On request
More detailsLithography Model SK-3000-AVPO Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsTool ID ASTEP-38 Tool Status Connected Wafer Size 200 mm Fab Section Lithography General Product Information Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 200 mm Maximum 200 mm Condition Good CE Marked YES Exterior Dimensions Year(s) : 1996 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 200 mm Maximum 200 mm Condition Good CE Marked YES Exterior Dimensions Year(s) : 1995 Location : EUROPE (Western and Northern)
Price : On request
More detailsTCDEV-26 TEL ACT 8 COATER/DEVELOPER (ex CTDV-A19) Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTCDEV-30 TEL ACT 8 COATER/DEVELOPER(former CTDV-A17) TEL ACT8, 200mm Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTRACK TEL ACT8 200mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details200mm TCDEV-24 JUSTIN ACT TRACK FOR 0.25um (former TCDEV-39) Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWAFER SIZE 8" Type: Electroplating Model Number: R310PD2(1SA2CFD1CAP)08(CuNi)03 SYSTEM GENERAL CONFIGURATION 3 Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More details300mm DYD2 Tool ID: DYD2 Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsBrand: HOE IE Enterprise TISI ID 151012-196 Manufacturer HOE IE Enterprise Model HIMJ-9134 Description Ph Location : ASIA (North East)
Price : On request
More detailsBrand: HOE IE Enterprise TISI ID 151012-197 Manufacturer HOE IE Enterprise Model HIMJ-9053 Description Ph Location : ASIA (North East)
Price : On request
More detailsTISI ID 150903-09 Manufacturer AMAT Model DPS Ⅱ Description Poly Etch Wafer Size 300mm Location : ASIA (North East)
Price : On request
More detailsTISI ID 150831-66 Manufacturer TEL Model ACT 12 Description Photoresist / T/F ProMOS module Wafer Size 30 Location : ASIA (North East)
Price : On request
More detailsTISI ID 150831-18 Manufacturer Canon Model FPA-5500iZa Description Lithography Wafer Size 300mm Vintage Location : ASIA (North East)
Price : On request
More detailsTISI ID 150831-16 Manufacturer ASML Model XT-1400F Description Lithography Wafer Size 300mm Vintage 2007 Location : ASIA (North East)
Price : On request
More detailsBrand: Sokudo TISI ID 150831-64 Manufacturer Sokudo Model RF-300A Description Photoresist Wafer Size 300 Location : ASIA (North East)
Price : On request
More detailsTISI ID 150831-16 Manufacturer ASML Model XT-1400F Description Lithography Wafer Size 300mm Vintage 2007 Location : ASIA (North East)
Price : On request
More detailsTISI ID 150831-18 Manufacturer Canon Model FPA-5500iZa Description Lithography Wafer Size 300mm Vintage Location : ASIA (North East)
Price : On request
More detailsIPA Wafer dryer Version: 200 mm -Stand-alone Marangoni Dryer -de-installed from working condition. -208v 60 hz Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsThis 200/ 300mm track system is built on a proven 200mm platform, the POLARIS 3500 Together with this machin Location : EUROPE (Western and Northern)
Price : On request
More detailsLithography Coater and Developer Manufacturer: Sokudo Version: 300 mm Deinstalled and warehoused. Can be insp Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAutomated Photoresist Coater Version: 200 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Lithography & Photoresist on Wotol
The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,
The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000, PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U, M150PC, BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640, MJB-55,
HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.