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Used Lithography & Photoresist

176 results
1

Automated Photoresist Coater Version: 150 mm/200 mm Automatic Shut down in Fab. Needs to be removed in the ne Location : AMERICA North (USA-Canada-Mexico)

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Automated Photoresist Coater Version: 150 mm/200 mm Vintage: Inquire Automatic Shut down in Fab. Needs to be r Location : AMERICA North (USA-Canada-Mexico)

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Polyimide Photo-resist Developer Track, 2D Version: 150-200 mm Vintage: 01.06.1996 The equipment has been prof Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)

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Automated Photoresist Coater Version: 200 mm Automatic Shut down in Fab. Needs to be removed in the next few Location : AMERICA North (USA-Canada-Mexico)

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Photoresist Coater and Developer tRACK, SOG type Version: 100 mm to 150 mm for Wafer Size: 4"- 6" Coater syst Location : AMERICA North (USA-Canada-Mexico)

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Developer with 3 developer units, Hotplates, Coolplates and Edge Exposure Unit Very good condition WAFER SIZ Year(s) : 2000 Location : EUROPE (Western and Northern)

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For sale is a Heidelberg instruments DWL200 direct laser writing system, which is mainly been used for photo Year(s) : 2007 Location : EUROPE (Western and Northern)

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CT-3600 Photovoltaics Solar Panel Cell Tester Assembly with Sorter Location : AMERICA North (USA-Canada-Mexico)

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Depth (in inches) 45 Width (in inches) 42 Height (in inches) 66 Weight (in pounds) 600.0000 SCS-4393 Photo Res Location : AMERICA North (USA-Canada-Mexico)

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Exterior Dimensions Width 38.000 in (96.5 cm) Depth 25.750 in (65.4 cm) Height 72.000 in (182 Location : AMERICA North (USA-Canada-Mexico)

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Photoresist coater and developer track with 3C and 3D Version: 200 mm Vintage: 01.09.2001 Recently de-installe Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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For Mark7 photoresist coater and developer De-installed from working condition and warehoused. For current co Location : AMERICA North (USA-Canada-Mexico)

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Brand: Solar Semi Coater Solar Semi Coater Microcluster 204 Coater with 2 Coatercups and Hoteplates Number o Location : EUROPE (Western and Northern)

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Dry Film Photoresist Laminator with LC-2400 Vacuum Base and Teknik PC600DT tacky roller cleaner 208/220 Vac, 1 Location : AMERICA North (USA-Canada-Mexico)

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Dynachem Dry Film Photoresist Laminator Model 300 24" wide Location : AMERICA North (USA-Canada-Mexico)

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Photoresist Spinner Coater Location : AMERICA North (USA-Canada-Mexico)

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Brand: WESTERN MAGNUM WESTERN MAGNUM XRL-120A Laminator - Photoresist S/N: 287 14671 Location : AMERICA North (USA-Canada-Mexico)

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EC101 PHOTORESIST COATER (CB-15) WITH 15″ DIAMETER BOWL AND TABLE TOP STAND Location : AMERICA North (USA-Canada-Mexico)

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Large substrate coater (typicially for photoresist) includes safety enclosure 6 six speeds 14 timers Location : AMERICA North (USA-Canada-Mexico)

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HAS COAT BAKE AND DEVELOP STATIONS Location : AMERICA North (USA-Canada-Mexico)

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4 HEAD PHOTORESIST COATER Location : AMERICA North (USA-Canada-Mexico)

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Photolithography Location : AMERICA North (USA-Canada-Mexico)

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SINGLE TRACK COATER WITH HOTPLATE Location : AMERICA North (USA-Canada-Mexico)

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8″ CAPABLE WITH CHUCK UPGRADE PROGRAMMABLE Location : AMERICA North (USA-Canada-Mexico)

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SPECIALTY COATING SYSTEMS P6000 TABLE TOP SPIN COATER 8″ BOWL (6″ CAPABLE WITH CHUCK UPGRADE) ADJUSTABLE SPEED Location : AMERICA North (USA-Canada-Mexico)

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You can find used Lithography & Photoresist on Wotol

The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,

The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000,  PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U,  M150PC,  BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640,  MJB-55,

HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment 
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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