Used Lithography & Photoresist
176 results6 inch vintage: 1995 As-is condition Complete with no missing parts Working condition before decommissioned P Year(s) : 1995 Location : EUROPE (Western and Northern)
Price : On request
More details5200, 200mm, s/n: 2070 Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details248 nm Lithography System Version: 300 mm Vintage: 01.06.2008 The tool is currently running wafers in producti Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVersion: 300 mm Vintage: 01.06.2011 CE Marked -Still installed in fab -Can be inspected by appointment -Laser Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhoto-lithography 248 NM DUV Scanner with photo-track Version: 300 MM Vintage: 01.06.2002 The equipmewnt has Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVersion: 300 mm Vintage: 01.06.2011 Laser type: CYMER ELS-7010 248 nm Software version: MCSW ver.180 OCSW ver. Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDual Block Photoresist Coater and Developer with 3C, 3D, R to L, ASML, i-line Version: 200 mm SMIF Vintage: 0 Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details-installed and operational -COMPLETE, NOT MISSING ANY PARTS, AND WILL BE SOLD WITH ALL ACCESSORIES -due for sw Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotoresist Spin Coater for max 200mm substrates spin coater with GYRSET system for better uniformity and lowe Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsStainless Thermoelectric cooling vessel for resists with digital controller TECA AHP-300CP thermoelectric cool Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSpecialty Coating Systems PDS 2010 Parylene Coating System. Specialty Coating Systems portable parylene deposi Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription: for Wafer Size: 4"- 6" Coater systems, 4"-6" (3) Zone hotplate Single / double cassette Fluorow Location : EUROPE (Western and Northern)
Price : On request
More detailsLIT:Direct writing equipment for inner and outer layers and solder resist Year(s) : 2017 Location : ASIA (North East)
Price : On request
More detailsLitho: exposure Year(s) : 2010 Location : ASIA (North East)
Price : On request
More detailsLitho: Exposure Year(s) : 1997 Location : ASIA (North East)
Price : On request
More detailsLitho: Exposure Location : ASIA (North East)
Price : On request
More detailsLitho: exposure Year(s) : 2004 Location : ASIA (North East)
Price : On request
More detailsE-280 Description Other: UV irradiation tool Location : ASIA (North East)
Price : On request
More detailsLit: laminating machine Year(s) : 2000 Location : ASIA (North East)
Price : On request
More details8626 Negative Developer Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details8626 Coater Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPlanar Pulsar Chemical Resist/Strip serial 52700-6306 Year(s) : 1993 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAutomated Resist Processing System Spray Resist Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details200mm, s/n: 8181620 Tool ID: SOGCT-05 Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCondition: very good Developer with 2 chambers for spray developing. Wafer Size Range Minimum 150 mm Maxi Year(s) : 1996 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used Lithography & Photoresist on Wotol
The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,
The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000, PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U, M150PC, BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640, MJB-55,
HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.