Used Semiconductor Equipment

Max Wafer: 200mm Configuration: Topside Alignment, 350W Lamphouse, UV400 Optics - Topside Alignment - 350W Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Spray Acid Tool (SAT) - Single Chamber - Up to 6"/150mm capable - Capacity: Single 25-Wafer Cassette, 150mm Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Max Wafer: 150mm Configuration: Electroplating Wet Bench, manual wafer loading, currently configured for 6 Year(s) : 2009 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Single chamber with load lock - Can process up to 8"/200mm wafers - Turbo Pump - AEI/RFPP RF5S 500W RF Gener Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Up to 8"/200mm wafer handling - Allows small batch processing for R&D and Pilot Production - Load-locked Sys Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Manual Mask Aligner - Topside Alignment (TSA) - Manual Alignment - Up to 6"/150mm Wafer Capable (with proper Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Max Wafer: 200mm Configuration: 4 Bonding Chambers, 10 kN Pressure Bonding Capability, Up To 550°C Fully aut Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Max Wafer: 150mm System Dimensions: 36 1/2 x24 1/2 x34 - Manual Wafer Load Mask Aligner - 500W NUV Lamphous Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Long Scan Surface Profilometer - Wafer Size: 8"/200mm - S/N: 1090-0420 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Max Wafer: 200mm System Dimensions: 30x40x66 Weight: 695 lbs - Automatic Surface Inspection System - Bare W Location : AMERICA North (USA-Canada-Mexico)

Price : On request

XRX-X4 X-Ray System Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Up to 8"/200mm wafer capable - Computer controlled - Measures roughness, waviness, step height, and other su Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Wafer Size 8" Vintage - . Scans samples up to 8 inch . Little or no sample preparation for increased produc Location : ASIA (North East)

Price : On request

System Measurement Performance Spreading Resistance Dynamic Range : 1Ω to > 10Ω Reistivity : 10-⁴~ 4x10⁴Ωcm Co Year(s) : 2004 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator I Year(s) : 2009 Location : ASIA (North East)

Price : On request

■ Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit Year(s) : 2008 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Year(s) : 2005 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

Price : On request

■ Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Auto wafer handling (Genmark robot & pre ali Year(s) : 2004 Location : ASIA (North East)

Price : On request

■ Capable up to 12" Wafer ■ SSM 42 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit Year(s) : 2001 Location : ASIA (North East)

Price : On request

Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers DUV - Vis - NIR: 190nm to 100 Location : ASIA (North East)

Price : On request

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 1996 Location : ASIA (North East)

Price : On request

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 0 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Year(s) : 2006 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

Price : On request