Nanometrics 2100

Ref : 2506185-9-AW

Condition : Used

Manufacturer : Nanometrics

Model : 2100

Year(s) : 1996

Quantity : 1

Location : Seller or machines location:
ASIA (North East)

Last check : 13 Dec. 2023

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.

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