Nanometrics 210

Ref : 2506133-9-AW

Condition : Used

Manufacturer : Nanometrics

Model : 210

Year(s) : 0

Quantity : 1

Location : Seller or machines location:
ASIA (North East)

Last check : 13 Dec. 2023

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.
Wafer Size 8"

Other machines similar to Nanometrics 210

1 Nanometrics 9100

Location : AMERICA North (USA-Canada-Mexico)

Year(s) : 2003

1 Nanometrics 9010

Location : EUROPE (Western and Northern)

Year(s) : 2008

1 Nanometrics 210

Location : AMERICA North (USA-Canada-Mexico)

1 Nanometrics NANOLINE III

Location : AMERICA North (USA-Canada-Mexico)

Year(s) : 1980