Used Plasma Etcher / Asher
443 resultsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier TOKYO ELECTRON LIMITED Mo Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsThe BT-1 is a complete industrial grade plasma treatment solution capable of plasma cleaning, plasma etching, Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Clean General Product Information Vendor Supplier Fusion Semiconductor Model 20 Year(s) : 1993 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier TOKYO ELECTRON LIMITED Mo Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier TOKYO ELECTRON LIMITED Mo Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Diffusion General Product Information Vendor Supplier TOKYO ELECTRON LIMITED Mo Year(s) : 1993 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDry: Etch chamber/12in. Year(s) : 2006 Location : ASIA (North East)
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More detailsWafer Size 200 mm Fab Section Thin Film General Product Information Vendor Supplier Lam Research Model Novell Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Thin Film General Product Information Vendor Supplier AMAT Model ENDURA P5500 V Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
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More detailsPLASMATHERM ODYSSEY HDRF ASHER consisting of: - Model: Odyssey HDRF - Configured for 150mm wafers - 2 Chambers Location : EUROPE (Western and Northern)
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More detailsWafer Size 300 mm Fab Section Thin Film General Product Information Vendor Supplier AMAT Model PECVD Producer Year(s) : 2014 Location : AMERICA North (USA-Canada-Mexico)
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More detailsION IMPLANTATION SYSTEM Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
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More detailsPLASMA CLEANER Location : AMERICA North (USA-Canada-Mexico)
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More detailsPlacement Machine (4) 12 nozzle heads Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
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More detailsSpin Etch Tool (8''tool) Condition Fair Exterior Dimensions Width 246.000 in (624.8 cm) Depth 109.0 Year(s) : 2006 Location : EUROPE (Western and Northern)
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More detailsPlasma Etch Version: 150 mm Vintage: 01.06.1995 The equipment was operational in the wafer fab up until Augus Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)
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More detailswet: Spin etcher Location : ASIA (North East)
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More detailsCommon Features of All 7500 Series Systems • Compact benchtop design permits easy integration into existing la Year(s) : 2010 Location : EUROPE (Western and Northern)
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More detailsPlasma Etch System: It uses a plasma-based process to selectively remove materials from the wafer surface, suc Location : AMERICA North (USA-Canada-Mexico)
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More detailsPECVD 80+ SiO2 Dep Non-functional tool but can be repaired (requires Silane MFC) Designed for 4” wafers but ca Location : EUROPE (Western and Northern)
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More detailsWafer Size 300 mm Fab Section Thin Film General Product Information Vendor Supplier AMAT Model FRONTIER - Etc Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
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More detailsOxide Etcher, fitted with 4 process chambers Version: 300 mm Vintage: 01.06.2012 -Tool Vintage: Jan 2012 -Tool Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size 200 mm Fab Section Etch General Product Information Vendor Supplier LAM Model 9600 BRME Vintage 19 Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
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More detailsOxide Etcher, fitted with 4 process chambers Version: 300 mm Vintage: 01.06.2010 -Mainframe vintage: June 2010 Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)
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More detailsDual Chamber R.I.E. Version: 200 mm Vintage: 01.06.1994 includes: -LH and RH chambers are RIE with adjustable Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.