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Used Wafer Equipment

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1

WSS Glass Demount Wafer Size Range Set Size 200 mm Condition Very Good Year(s) : 2014 Location : EUROPE (Western and Northern)

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Condition Good Power Requirements 220 V 24.0 A 15.0 A(2) 50 Hz 3 Phase Year(s) : 2008 Location : EUROPE (Western and Northern)

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WAFER SPECIFICATION Wafer Size 150mm SYSTEM CONFIGURATION CHAMBER A CHAMBER B Year(s) : 2007 Location : EUROPE (Western and Northern)

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Condition Good Power Requirements 200-240 V 50/60 Hz 3 Phase Weight 1,213 lb (550 kg) Year(s) : 2011 Location : EUROPE (Western and Northern)

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Tool still maintained within Basic-Maintenance contract by KLA! Condition Excellent Power Requirements 208 V Year(s) : 2017 Location : EUROPE (Western and Northern)

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Wafer Size 300 mm Fab Section Clean General Product Information Software Version 258000 CIM E84, SECS/GEM, GE Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)

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Wet Process Equipment Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Deep UV Wafer Stepper 300mm, s/n: 8732034 Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size 200 mm Fab Section Test General Product Information Vendor Supplier TEL Model P8XL Prober Vintage Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size 300 mm Fab Section Test General Product Information Vendor Supplier TEL Model Precio XL Vintage 20 Year(s) : 2021 Location : AMERICA North (USA-Canada-Mexico)

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Asset Description Wafer prober Software Version 4.9.3_160381 Process Wafer prober Hardware Confguration (Fab) Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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Single Wafer Resist Strippers Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)

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E220 EHPi, 8" DI Cart: EHPI, B-Pure filter Chamber A (DPN): Aluminum material Gas box: 4-Sicks HP SDS2 Missing Year(s) : 2001 Location : EUROPE (Western and Northern)

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1

Complete and working condition Still installed Year(s) : 1992 Location : EUROPE (Western and Northern)

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Ion Implanters 200mm Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

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Currently tool is still warm down Condition Good Year of Manufacture 2006 Year(s) : 2006 Location : EUROPE (Western and Northern)

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Type: Laser Equipment Configuration: 2008 Vintage Year(s) : 2008 Location : EUROPE (Western and Northern)

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Model: Prometrix UV-1280SE Configured for 100mm and 150mm handling Measures Film Thickness, Refractive Index ( Location : AMERICA North (USA-Canada-Mexico)

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KLA-TENCOR SURFSCAN 6420 PARTICLE INSPECTION SYSTEM consisting of: - Model: Surfscan 6420 - Particle inspectio Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size 200 mm Fab Section Clean General Product Information Vendor Supplier CFM Model FullFlow 1/99 8100 Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)

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Detaping 6" thinwafer Wafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Cassette to Ca Year(s) : 2006 Location : EUROPE (Western and Northern)

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Wafer Size 200 mm Fab Section Clean General Product Information Vendor Supplier CFM Model FullFlow 1/99 8100 Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 200 mm Maximum 300 mm Set Size 300 mm Cassette to Cassette YES Wafer Hand Location : AMERICA North (USA-Canada-Mexico)

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200mm, s/n: 1080 Location : AMERICA North (USA-Canada-Mexico)

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wafer Location : AMERICA North (USA-Canada-Mexico)

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You can find used Wafer Equipment on Wotol

The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics

The main model  MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150,  6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880

HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers. 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices

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