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Used CVD Equipment

218 results
1

Version: 150 mm Vintage: 01.06.1992 The equipment was operational in the wafer fab up until August 2024. The Year(s) : 1992 Location : AMERICA North (USA-Canada-Mexico)

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1

ICP-PECVD deposition system for solar wafers Version: 156 mm square (200 mm) Vintage: 01.06.2015 PECVD deposi Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)

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1

CVD: MOCVD Location : ASIA (North East)

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Wafer Size 300 mm Fab Section Diffusion General Product Information Vendor Supplier APPLIED MATERIALS Model C Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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1

Large Area PECVD system, used for SiO and SiN process depositions Version: 150 mm Vintage: 01.06.2015 Plasmat Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size 300 mm Fab Section R&D General Product Information Vendor Supplier Novellus Model Novellus Vector Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)

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CVD: MOCVD/4in. Year(s) : 2007 Location : ASIA (North East)

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1

CVD: PECVD Location : ASIA (North East)

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CVD: MOCVD/2-4in Year(s) : 2010, 2012 Location : ASIA (North East)

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SPEED, 300mm, s/n: 03-9-C30214 300MM WTS with 2 HDP STI oxide chambers Tool ID: JID1 Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

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Number of Chambers: 6 Accessories: We sell the whole tool with all accessories CE Marked: YES Condition: Excel Year(s) : 2005 Location : EUROPE (Western and Northern)

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1

Vertical LPCVD Furnaces Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)

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1

Chemical Vapor Deposition Equipment Year(s) : 2017 Location : AMERICA North (USA-Canada-Mexico)

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21

Tool Status: Deinstalled and crated and in storage. (March 2023) like new! Wafer Size 300 mm Process PE-ALD S Year(s) : 2010 Location : EUROPE (Western and Northern)

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0

Ion implanter Year(s) : 2013 Location : ASIA (North East)

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0

CVD: MOCVD Year(s) : 2008 Location : ASIA (North East)

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1

CVD: MOCVD/4in. Year(s) : 2007 Location : ASIA (North East)

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CVD: APCVD Maker AMAYA Model AEC2250SP-296 Location : ASIA (North East)

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1

CVD: APCVD Year(s) : 1998 Location : ASIA (North East)

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1

PVD:Sputter Maker TEAMS CORPORATION Year(s) : 2018 Location : ASIA (North East)

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1

CVD: APCVD/6in Location : ASIA (North East)

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PVD:Evaporator Year(s) : 2018 Location : ASIA (North East)

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PVD:Sputter/6in Location : ASIA (North East)

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CVD: MOCVD/2in. Year(s) : 2007 Location : ASIA (North East)

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CVD:MOCVD/4in Location : ASIA (North East)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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