Oxford Plasmalab 400 PVD

Sources:
· (x2) RF Magnetrons with (x2) Matching units
· (x1) RF generator 3kW AE RFG3001 switchable between two targets
· (x2) 8 inch targets, bonded to water cooled backing plates
· (x1) RF generator 600W Dressler HiLight136 Table Bias#
· Current targets installed: Si02, Al
· Spare targets: SiN, ITO

Vacuum:
· Process chamber backing pump Adixen 2033 PFPE
· Process chamber turbo pump Alcatel ATP1600
· Loadlock backing pump Edwards E2M40
· Loadlock turbo pump Alcatel ATP80
· Process chamber isolation throttle VAT valve

Gas
· (x3) MKS MFCs
02 50 sccm
Ar 200 sccm
N2 50 sccm

Electrical / Control:
· 400VAC
· B&R MiniConrol Black PLC
· ArcNet comms
· Windows XP PC

Wafer handling:
· 4 inch substrate
· Manual single wafer load to Loadlock
· Auto arm transfer from Loadlock to Process Chamber
· 8 wafer positions on rotating table
· Water cooled table Neslab RTE111 chiller