Oxford Plasmalab 100 PECVD

OXFORD PLASMALAB 100 PECVD consisting of:
- Model: Plasmalab 100 PECVD
- Process: SiO2 and SiN deposition
- Max Wafer Size Capable: 8"/200mm
- Single wafer process up to 8-inch wafer
- Load Locked Chamber
- 600W RF Generator
- Substrate Electrode: 205mm
- Shower Head Gas Inlet Optimised for PECVD
- 400° C Substrate Table
- System Computer
- System Chiller
- Alcatel 2033 Vacuum Pump (Loadlock Pump)
- Alcatel 2033 Vacuum Pump & RSV301B Blower (Chamber Pump)
- Oxford PC2000 Software
- Windows XP Operating Software (OS)
- Operations Manuals for Plasmalab 100 PECVD
- CE Certified

- Gas cabinet setup with 7 gases as follows:
1. CF4/O2 500sccm MKS 1179 viton seals
2. N2 2SLM MKS 1179 viton seals
3. N2O 1SLM MKS 1179 viton seals
4. HE 2SLM MKS 1179 viton seals
5. SiH4 50sccm MKS 1479 metal seals
6. PH3/AR 50sccm MKS 1479 metal seals
7. B2H6/AR 50sccm MKS 1479 metal seals

Condition: Refurbished