Used CVD Equipment
230 resultsCVD: PECVD Location : ASIA (North East)
Price : On request
More detailscvd: Pro ALD system Year(s) : 2019 Location : ASIA (North East)
Price : On request
More detailsCVD: PECVD/4in Location : ASIA (North East)
Price : On request
More detailsChemical Vapor Deposition Equipment 200mm Year(s) : 2011 Location : United States (USA)
Price : On request
More detailsWafer Size 200 mm Fab Section Thin Film General Product Information Vendor Supplier AMAT Model CENTURA MCVD S Year(s) : 2001 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Thin Film General Product Information Vendor Supplier AMAT Model PECVD Producer Year(s) : 2014 Location : United States (USA)
Price : On request
More details300mm, s/n: T239683 Year(s) : 2012 Location : United States (USA)
Price : On request
More detailsWafer Size 200 mm Fab Section Implant General Product Information Software Version 13.42.18 CIM GEM and SECS Year(s) : 2007 Location : United States (USA)
Price : On request
More detailsWafer Size 200 mm Fab Section Thin Film General Product Information Vendor Supplier Lam Research Model Novell Year(s) : 2000 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Thin Film General Product Information Vendor Supplier AMAT Model Producer SE Vi Year(s) : 2011 Location : United States (USA)
Price : On request
More details200mm, s/n: 97-46-5419 Year(s) : 2000 Location : United States (USA)
Price : On request
More detailsGeneral Product Information Vendor Supplier Applied Material Model Quantum Leap II Vintage 2002 Asset Descript Year(s) : 2002 Location : United States (USA)
Price : On request
More detailsWafer Size 300 mm Fab Section Diffusion General Product Information Vendor Supplier APPLIED MATERIALS Model C Year(s) : 2006 Location : United States (USA)
Price : On request
More detailsSPEED, 300mm, s/n: 03-9-C30214 300MM WTS with 2 HDP STI oxide chambers Tool ID: JID1 Year(s) : 2003 Location : United States (USA)
Price : On request
More detailsVertical LPCVD Furnaces Year(s) : 2015 Location : United States (USA)
Price : On request
More detailsChemical Vapor Deposition Equipment Year(s) : 2017 Location : United States (USA)
Price : On request
More details3 Chamber System with 2 Year(s) : 1996 Location : United States (USA)
Price : On request
More detailsTool ID DF-OHT-02 Wafer Size 300 mm Fab Section Diffusion General Product Information Vendor Supplier TEL Mod Year(s) : 2006 Location : United States (USA)
Price : On request
More detailsTool ID DF-PLD-07 Wafer Size 300 mm Fab Section Diffusion General Product Information Vendor Supplier TEL Mod Year(s) : 1999 Location : United States (USA)
Price : On request
More detailsTEL ALPHA-8S-Z, 200mm Tool ID: SOGCU-05 Year(s) : 2002 Location : United States (USA)
Price : On request
More detailsTEL PRECIO NANO WITH SINGLE FOUP LOADER Year(s) : 2002 Location : United States (USA)
Price : On request
More detailsLow Energy Implanter 200mm Year(s) : 2000 Location : United States (USA)
Price : On request
More detailsTEL NEXX APOLLO HP PVD SYSTEM SPT03 RFL02 SemiGEAR Reflow Tool Year(s) : 2012 Location : United States (USA)
Price : On request
More detailsBOLD APPLIED MATERIALS AMAT CENTURA II consisting of: - Model: Centura II - 2 DPS / DTM Chambers - SBC Sys Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Number of Chambers 3 Chamber 1 Desc Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.