Used CVD Equipment
218 resultsPVD cluster tool with 6 chambers (Used for Al, Ti, NiV and AG) Version: 200 mm Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFill Sputter Deposition System Version: 125 mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVertical LPCVD Furnace Version: 300 mm Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCD-60 Super Catalytic Decomposition System Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLoad-locked, fully automated (CX 2003A controller) High throughput Cassette-to-cassette vertical react Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVTP 1500 LH LPCVD (SiN) Reactor is configured for SiN processing of 200 mm wafers. System is fully automated w Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details4504 Four Stack LPCVD Reactor configured for PolySi, Silicon Nitride, SiO2/PSG/BPSG, and TEOS/PTEOS/BPTEOS. Sy Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPhotovoltaics diffusion oxidation furnace with 2 oxidation tubes NEW STILL IN ORIGINAL CRATES Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Manual Wafer Load Plasma Asher - Used for Wafer Cleaning and Descum - Can Process up to 150mm Wafers - Farad Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Single PECVD chamber, non load-locked - Input Power: 208V, 3ph - Heated Platen up to 400 C - Max Wafer Size Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Load Locked Chamber - System PC, Keyboard, Mouse - Windows 7 w/ PC4000 Software - 490mm Diameter Aluminum L Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsex-1204 (exhaust controller) cable(cx-1204 mainbody) Year(s) : 1988 Location : ASIA (China - Taiwan - HKG)
Price : On request
More details<b>1x, Novellus, Concept 1 CVD</b> 200mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: Applied Materials Model: P5000 CVD SYSTEM Specifications • Used • Description CVD System • Reference N Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsChemical vapor deposition 2007 or 2008 Evaporation Pyrolyse Tank dia 700 x670 h Pump edwards em80 Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsBrand: W-j Wj TEOS-NSG WJ999 160422-006 TEOS CVD WJ999 S/N：4638 Location : ASIA (North East)
Price : On request
More details- SOG deposition - one spin module - bakes (HH,H,cool) - vertical furnace Year(s) : 1994 Location : EUROPE (Western and Northern)
Price : On request
More detailsBrand: Novellus Year: 2005 CVD – HDP Specifications • Used • Vintage 2005 • Process CVD – HDP • Wafer Size Year(s) : 2005 Location : ASIA (South East)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.