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Used CVD Equipment

218 results
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Metal Wafer Size 12" Year(s) : 2001 Location : ASIA (North East)

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P-CVD(E-10) Year(s) : 1999 Location : ASIA (North East)

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Vertical LPCVD Furnace Location : ASIA (North East)

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Nitride, DxL, / 4C/H Wafer Size 8" Year(s) : 1998 Location : ASIA (North East)

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Sputtering device Year(s) : 2009 Location : ASIA (North East)

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Sputtering system wth load lock Location : ASIA (North East)

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DxL / 4C/H Wafer Size 8" Location : ASIA (North East)

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TEOS / 2C/H Wafer Size 8" Location : ASIA (North East)

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TEOS / 3C/H Wafer Size 6" Location : ASIA (North East)

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CVD DxL Nitride / 4C/H Location : ASIA (North East)

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MOCVD Year(s) : 2008 Location : ASIA (North East)

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Nitride Wafer Size 8" Year(s) : 1991 Location : ASIA (North East)

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DxL / 2Ch Wafer Size 6" Year(s) : 1995 Location : ASIA (North East)

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CVD Ti&CVD TIN Wafer Size 200mm Location : ASIA (North East)

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Delta Teos / 3Ch Wafer Size 6" Year(s) : 1995 Location : ASIA (North East)

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Delta TEOS DxL / 3C/H Wafer Size 8" Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)

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Brand: JPEL P-CVD Lead Time Immediately Year(s) : 1999 Location : ASIA (North East)

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DxL Wafer Size 8" Location : ASIA (North East)

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1

Vertical Furnace for LPCVD SOD Process Version: 200 mm Vintage: 01.06.2007 Vintage 2007.01 Software OS L Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)

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Sputtering System 2400 – 8L Load Lock Sputter Deposition Coater Comes with AE MDX 1K RF Power Generator Location : AMERICA North (USA-Canada-Mexico)

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8 inch substrate. Manual load/unload. Vacuum function. Location : AMERICA North (USA-Canada-Mexico)

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PVD cluster tool Version: 150 mm Vintage: 01.06.1990 This tool was not operational prior to removal and has m Year(s) : 1990 Location : AMERICA North (USA-Canada-Mexico)

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ICP PECVD system for solar cells production Version: Solar Vintage: 01.06.2015 -STILL INSTALLED. IN EXCELLENT Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)

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TEL ALPHA-8S-Z, 200mm Tool ID: SOGCU-05 Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)

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2 CVD Chamber 6 inch complete ENI OEM-12B AMAT-0 chiller Location : EUROPE (Western and Northern)

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You can find used  CVD Equipment on Wotol

The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson

The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG

HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories. 

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