Used CVD Equipment
218 resultsSpecification : Wafer Size: 200mm Robot: HP(buffer and Transfer) Loadlock: Narrow Bod Location : EUROPE (Western and Northern)
Price : On request
More detailsCMP Manufacturer AMAT Model Reflexion Location : EUROPE (Western and Northern)
Price : On request
More detailsTEL PRECIO NANO WITH SINGLE FOUP LOADER Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWAFER SIZE 12 Location : EUROPE (Western and Northern)
Price : On request
More detailsDiffusion LPCVD Nitride x01 Reactor Wafer Size 8 Location : EUROPE (Western and Northern)
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More detailsPECVD (Chemical Vapor Deposition) WAFER SIZE 12 Location : EUROPE (Western and Northern)
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More detailsMaterials Research Corp. 8671 RF Sputtering Vacuum Chamber Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Maximum 150 mm Set Size 125 mm Controller Type Microprocessor Controller Type Contr Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures 2 - 4 channel valve control PCB (for the nupro valves) • 1/8" tubing for the nupro valves (~40 ft) • Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsENDURA IMP Ti/TiN PVD 200 mm SNNF Wide body L/L HP Robots 2 x OD 2 x PCII 2 x IMP TiN 1 x IMP Ti 2 x CTI 96 Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsTyp: 10000186 UV 300/400 50 Hz 3” Chuck, 4” x 4” Mask Holder Objectiv Leitz 5x 0,09; 10x 0,20; 20x 0,40; 32 Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsDescription CVD Deposition with ECR source Wafer Size Range Minimum 50 mm Maximum 300 mm Controller T Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
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More detailsDescription PECVD TEOS with Load Lock Wafer Size Range Maximum 200 mm Process PECVD & TEOS Controller T Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVacuum System None Vacuum System Chamber made up of the 8" CF 4-way cross, M/N: 600-4T, 304SS 8" CF Door/V Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription In-Line Sputtering System Vacuum System Diffusion Pumped Load Lock Included Yes Power Requireme Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsThin Flim Deposition Controller Other Information System Components: Control unit: P/N 753-003-G1 Sensor cont Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription Gen 5 PEVCD Chamber - New Accessories Substrate Size: 1200 mm x 1300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsGen 6 PEVCD Chamber - Accessories Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLow Energy Implanter 200mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTEL NEXX APOLLO HP PVD SYSTEM SPT03 RFL02 SemiGEAR Reflow Tool Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsReticle Handler Model RSR160 Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsManufacturer Noevllus DKN config Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More details• Process: PECVD iN,SiO2, i-a-Si, SiON and N+ a-Si • SoFware Version: AKT7.3 • System Power RaNng: 208 VAC 3-P Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsCVD Model Vector Express Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsConfiguration: - MAG7 Brooks Robots - MC3 Novellus Module controller - Pfeiffer Turbo and turbo controller - Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.