TEL Trias

High K Metal CVD and ALD system, NiOx, HfOx process
Version: 300 MM
Vintage: 01.06.2012

Tokyo Electron Trias High K CVD CVD System, 12” 45nm process
Vintage 2012
Chambers: CVD ALD
Process: NiOx, HfOx
Trias cluster: 2 Loadports LM
Main power distribution (MPD) Transfer module, TM EX reactor, PM2
Plasma capability: No
Includes: Ozonizer H20 Box 2 Touch screens ozonizer
High-k CVD reactor PM4:Thermal based deposition
Transformer box (Hi-K) option elec box: Machine is in as good
as new condition ex R&D facility
PM2: Hafnium Nickel Titanium Vanadium
PM4: Hafnium Nickel Titanium Ruthenium Strontium