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Used Plasma Etcher / Asher

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1

Wafer Size Range Minimum 100 mm Maximum 150 mm Condition Good Serial Number(s) Inline-Sprühätzanlage Year(s) : 2009 Location : EUROPE (Western and Northern)

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Dip-etch wet bench Year(s) : 1998 Location : EUROPE (Western and Northern)

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Automtic dip-etch bench Complete dip acid etching unit manufactured by KVA, Austria. The system is still in Year(s) : 2014 Location : EUROPE (Western and Northern)

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Rota-Spray Etcher Location : AMERICA North (USA-Canada-Mexico)

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ALUMINUM CHAMBER ID 6X6X10″ WIDE REBUILT DIRECT DRIVE PUMP AVAILABLE FOR ADDITIONAL FEE FOMBLIN/KRYTOX PREP (I Location : AMERICA North (USA-Canada-Mexico)

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PM 119 RF GENERATOR (500 WATTS) 10″ DIAM X 20″DEEP QUARTZ CHAMBER 3 GAS CAPABLILITY INCLUDES FOMBLIN PREPPED D Location : AMERICA North (USA-Canada-Mexico)

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750 WATT GENERATOR, 3 GAS CAPABILITY 10X20″ QUARTZ BARREL INCLUDES FOMBLIN PREPPED DIRECT DRIVE VACUUM PUMP DO Location : AMERICA North (USA-Canada-Mexico)

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TABLE TOP REACTIVE ION ETCHER ONE WAFER UP TO 6″ DIAMETER PER CYCLE TURBO PUMPED MICROPROCESSOR CONTROLLED REB Location : AMERICA North (USA-Canada-Mexico)

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HF-8 Plasma System LCD Display Dual Mass Flow Controllers Parallel Plate Shelf Optional Rebuilt Dual Stage Vac Location : AMERICA North (USA-Canada-Mexico)

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Plasma Asher, Rebuilt with Full Support. Other models available Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 200 mm Number of Chambers 1 Process Capabil Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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Rated Power Output 1000 Watts Chamber Construction Aluminum/box Chamber Size Width 13.00 in (33.02 cm Location : AMERICA North (USA-Canada-Mexico)

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Features: Flexible range. Capable of 1 to 100W operation Greater stability Reproducible conditions Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Barrel Rated Power Output 600 Watts Reactor Center Cylindrical Reactor Center Size Depth 1 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Maximum 200 mm Process PECVD/Plasma Etch/Reactive Ion Etch Controller Type Microproces Location : AMERICA North (USA-Canada-Mexico)

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Rated Power Output 1250 Watts Chamber Construction Aluminum Chamber Size Width 14.75 in (37.47 cm) Location : AMERICA North (USA-Canada-Mexico)

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8300 Weight 36 lb (16 kg) Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Planar - Magnetron Rated Power Output 4000 Watts Reactor Center Rectangular Reactor Center Size Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Chlorine Etch Loadlock Loadloc Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Silicon Etch Bosch Process Loadlo Location : AMERICA North (USA-Canada-Mexico)

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Maximum 100 mm Process Plasma etch Controller Type Microprocessor Controller Type End Point Detection Yes Location : AMERICA North (USA-Canada-Mexico)

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Rated Power Output 300 Watts Reactor Center Cylindrical Reactor Center Size Depth 12.00 in (30.48 cm) Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Box Rated Power Output 600 Watts Reactor Center Rectangular Reactor Center Size Width 12.0 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 75 mm Maximum 200 mm Set Size 150 mm Process Nitride Etch Controller Type Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Process RIE/Plasma Deposition Controller Type Micropro Location : AMERICA North (USA-Canada-Mexico)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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