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Used Plasma Etcher / Asher

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Brand: TOKYO OHKA Dry etching system (SiN) Year(s) : 1984 Location : ASIA (North East)

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Brand: Plazma Systems Resist asher (tube type) Year(s) : 1982 Location : ASIA (North East)

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Brand: DES-212 Low temperature asher Lead Time Immediately Year(s) : 1981 Location : ASIA (North East)

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Brand: Plazma Systems Resist asher (tube type) Lead Time Immediately Year(s) : 1983 Location : ASIA (North East)

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Photoresist Stripper/Asher/Etcher System Location : AMERICA North (USA-Canada-Mexico)

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Barrel Photoresist Stripper/Asher/Etcher System Location : ASIA (North East)

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Brand: ASM Plasma CVD(SiO2) Wafer Size 200mm Location : ASIA (North East)

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Configuration: Supports wafer sizes up to 300mm (330mm Platen) RIE set up for SiO2 Etch RF Gener Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)

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S4075-11020 Barrel Plasma Asher D380-015 With 4000C controller and PM-112 RF Generator Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size: 3,4,5,6 inch capability Gas Lines: 4 Location : AMERICA North (USA-Canada-Mexico)

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Plasma Etch along with Leybold Trivac D16B Vacuum Pump Location : AMERICA North (USA-Canada-Mexico)

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2000 Dry Plasma Etcher Asher, Plasma Cleaner System Location : AMERICA North (USA-Canada-Mexico)

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RIE 10 NR – SAMCO RIE 10NR Reactive Ion Etch System | Dry Etching System / Tool with Thermo Electron Thrmoflex Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)

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ENI ACG10B 1200W Rf 13.56mhz generator 2 powered shelves 1000 SCCM N2;500 SCCM N2 Location : AMERICA North (USA-Canada-Mexico)

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Features ISOLATED REACTOR DESIGN REACTIVE JON ETCH REACTOR 6″ OR 8″ WAFER CAPABILITY CLOSED LOOP TEMPERATURE C Location : AMERICA North (USA-Canada-Mexico)

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PX-250 Plasma Asher Etcher w/ Seren IPS R300 13.56MHz RF Location : AMERICA North (USA-Canada-Mexico)

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– Used for photoresist stripping and surface cleaning, as well as etching silicon and its compounds – Chamber Location : AMERICA North (USA-Canada-Mexico)

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Chamber 21x22x21 inch; O2,Ar, 600w , 13.56MHz Location : AMERICA North (USA-Canada-Mexico)

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Fuji sFAB-D automated odd-form inserter (2017) Multi-purpose automated fabrication machine, flexibly supports Year(s) : 2017 Location : AMERICA North (USA-Canada-Mexico)

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IION RIE Location : AMERICA North (USA-Canada-Mexico)

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WAFER SIZE 6,8 Year(s) : 2007 Location : EUROPE (Western and Northern)

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This system was only used in an R&D Lab for O2 Plasma clean of medical device. It is in excellent condition. Year(s) : 2000 Location : EUROPE (Western and Northern)

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Dry Etcher Version: 200 mm De-installed from working condition and warehoused. Please refer to the attached p Location : AMERICA North (USA-Canada-Mexico)

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4 chambers Wafer Size 8,12 Year(s) : 2008 Location : EUROPE (Western and Northern)

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4 chambers Wafer Size 8,12 Year(s) : 2003 Location : EUROPE (Western and Northern)

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You can find used Plasma Etcher / Asher on Wotol

The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.

The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100,  P-5020E P-5030, PE-8330A, ILD-4033,  Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2,  DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XS5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries  8800, MK III , L3200, ATE-3000.

HS Code  8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.  

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