Oxford 100 RIE

Configuration:

Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for SiO2 Etch
RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz,
Chamber Turbo Pump : Alcatel ATH 400M w/ ACT 600M controller
Blue color PLC type
Water cooled electrode 10C-80C
Gas pod with 6 lines including following MFCs: Ar – 100sccm N2 – 200sccm CHF3 – 200sccm NF3 – 200sccm N2O – 200sccm
Windows PC , user friendly interface
Lauda WK 1200 Chiller was utilized by previous user. Not included.