2 Oxford Plasmalab 80 Plus PECVD tools

PECVD 80+ SiO2 Dep
Non-functional tool but can be repaired (requires Silane MFC)
Designed for 4” wafers but can do 6”
Deposits SiO2 & SiH4 @ 300C
All MFCs for above processes are operational bar the Silane one
Is an OIPT tool but has bespoke software.
Built 1995, software upgrade 2010
No burner gas abatement
Control PC
Edwards E2M80 vacuum pump
Rf Generator

PECVD 80+ SiNx Dep
Functional tool
Designed for 4” wafers but can do 6”
Deposits SiO2, SiH4 & Amorphous Si @ 300c
Has working MFCs to achieve above deposition
Is an OIPT tool built 1998
Burner gas abatement
Control PC
Edwards E2M80 vacuum pump
Rf Generator