Allwin21 AccuThermo AW820V ([email protected])
AMERICA North (USA-Canada-Mexico)
Please visit our website for updated information at www.allwin21.com
Updated Brochure in2024:https://allwin21.com/wp-content/uploads/2024/05/Allwin21-Product-Brochures-Rapid-Thermal-Processors-2024.5-1.pdf
Allwin21 Corp. AccuThermo AW 820V – Vacuum RTP
Wafer Size: Small~8 inch
Type: Stand Alone, Vacuum
Temperature: 100~800°C or 450~1250°C or 1250~1500°C
Gas Lines: 1 ~ 4 lines
SPECIFICATION
Stand Alone and Manual loading of wafer into the oven
Single wafer processing.
Substrate: 2″, 3″, 4″,5″,6″,8″; Square or round; Transparent and Nontransparent
Ramp up rate: Programmable, 10°C to 150°C per second.
Recommended steady state duration: 0-600 seconds per step.
Ramp down rate: Non-Programmable, 10°C to 150°C per second..
Recommended steady state temperature range: 150°C – 1150°C
Vacuum Pressure (Optional): 50 mtorr to 13 Torr or 13 Torr to 760 Torr
Atmospheric function is optional
Patented Temperature Sensor temperature accuracy: ±1°C.
Thermocouple temperature accuracy: ±0.5°C
Temperature repeatability: ±0.5°C or better at 1150°C
Temperature uniformity: ±8°C across a 8″ (200mm) wafer at 1150°C
For many years AG Associates was the dominant manufacturer of RTP systems. It was founded in 1981 and produced the first single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being used around the world in manufacturing, R&D and Universities. These RTP systems have a proven track record for reliability and simplicity.
Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Processing equipment. Allwin21 is manufacturing the new AccuThermo AW Series Atmospheric Rapid Thermal Processors and Vacuum Rapid Thermo Processors.Compared with traditional RTP systems, Allwin21″s AccuThermo AW RTPs have innovative software and more advanced temperature control technologies to achieve the best rapid thermal processing performance ( repeatability , uniformity and Stability etc.).