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5 Allwin21 AccuThermo AW820M ([email protected])

Ref : 1841279-9-CP
Condition : Used
Manufacturer : Allwin21
Model : AccuThermo AW820M ([email protected])
Year(s) : 2024
Quantity : 5
Location : Seller or machines location:
AMERICA North (USA-Canada-Mexico)
Last check : 17 Apr. 2024

Please visit our website for updated information at www.allwin21.com

Updated Brochure in2024:https://allwin21.com/wp-content/uploads/2024/05/Allwin21-Product-Brochures-Rapid-Thermal-Processors-2024.5-1.pdf

Why Allwin21 AccuThermo AW820M Semiconductor front end rapid thermal processing euqipment: https://allwin21.com/wp-content/uploads/2024/05/AccuThermo-AW-820M-Rapid-Thermal-Processor-1.pdf

Allwin21 Corp. AccuThermo AW 820 RTP

Wafer Size: Small~8 inch
Type: Desktop, Atmospheric
Temperature: 100~800°C or 450~1250°C
Gas Lines: 1 ~ 5 lines

Specifications:
Wafer handling: Manual loading of wafer into the oven, single wafer processing.
Wafer sizes: 2″, 3″, 4″ ,5″ , 6″ ,8″ wafers.
Ramp up rate: Programmable, 10°C to 200°C per second.
Recommended steady state duration: 0-300 seconds per step.
Ramp down rate: Programmable, 10°C to 250°C per second. Ramp down rate is temperature-and-radiation-dependent and the maximum is 125°C per second.
Recommended steady state temperature range: 150°C – 1150°C
ERP temperature accuracy: ±1°C, when calibrated against an instrumented thermocouple wafer (ITC).
Thermocouple temperature accuracy: ±0.5°C
Temperature repeatability: ±0.5°C or better at 1150°C wafer-to-wafer. (Repetition specifications are based on a 100-wafer set.)
Temperature uniformity: ±7°C across a 8″ (200 mm) wafer at 1150°C. (This is a one sigma deviation 100 angstrom oxide.) For a titanium silicide process, no more than 7% increase in non-uniformity during the first anneal at 650°C to 700°C.
Process/Purge gas inputs: Any inert and/or non-toxic gas regulated to 30 PSIG and pre-filtered to 1 micron. Typically, Nitrogen (N2), oxygen (O2), argon (Ar), and/or helium (He) are used.


For many years AG Associates was the dominant manufacturer of RTP systems. It was founded in 1981 and produced the first single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being used around the world in manufacturing, R&D and Universities. These RTP systems have a proven track record for reliability and simplicity.


Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Processing equipment. Allwin21 is manufacturing the new AccuThermo AW Series Atmospheric Rapid Thermal Processors and Vacuum Rapid Thermo Processors.Compared with traditional RTP systems, Allwin21″s AccuThermo AW RTPs have innovative software and more advanced temperature control technologies to achieve the best rapid thermal processing performance ( repeatability , uniformity and Stability etc.).

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