Allwin21 AW-303R ([email protected])

Please visit our website for updated information at www.allwin21.com

Updated Brochure in2024：https://allwin21.com/wp-content/uploads/2024/05/Allwin21-Product-Brochures-Plasma-Etcher-2024.5-1.pdf

Why Allwin21 AW-303R Semiconductor front end plasma etcher equipment: https://allwin21.com/wp-content/uploads/2024/05/AW-303R-Downstream-Plasma-Etcher-for-Low-Plasma-Damage.pdf

Manufacturer: Allwin21
Condition: New
Wafer Size: 2″ – 6″ Capability
Wafer Loading: 3-axis Robot
Plasma Power: 13.56MHz Aircooling RF Generator, 300W/600W
Type: Downstream Reactor Structure, Parallel/Single Wafer Process; Stand-Alone
Gas Lines: Up to 3 Lines with MFC, NF3,O2,He

Allwin21 Corp. has been focusing on providing solutions and enhancements to Matrix 105, Matrix 105R, Matrix 205, Matrix 10 (1104, 1107, 1108) used plasma Asher Descum semiconductor process equipment and Matrix 303,Matrix 403 ,Matrix 10(1303, 1307)used plasma Etch semiconductor process equipment. These OEM semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system(Video) and new critical components to achieve the goal of giving our customers a production edge with right cost.