Used Wafer Equipment
406 resultsPM-5 manual prober with 6in vacuum chuck and Mitutoyo FS60 microscope with motorized XY Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLeica objectives 3.5x/10x/20x 350W lamphouse with Ushio USH-350DS Hg lamp UV400 near UV optics, 350-450nm, 0. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsProgrammer 10 programs of up to 10 steps each Custom base cabinet with pull out photoresist cannister tray Max Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailswafer diameter 2"-6" heated wafer stage Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsdie matrix expander max 150mm wafers Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMikroskop 220 V ~ / 50 - 60 Hz / 20 VA B (width) m / T (depth) m H (height) m / G (weight) kg Yes) good Location : EUROPE (Western and Northern)
Price : On request
More details- SN: 0396 - Genmark Gencobot 8/3L Handler - Thermo Scientific A40 Chiller with PC 200 Immersion Circulator Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details300mm Prober single foup VIP3A Tool ID: 33B4WA Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAdvanced Macro Inspection Module sn: V000283, 300mm Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDetails: - Semi-Automated Spray Solvent Tool (SST) - Batch Solvent Processor for Wafer Cleaning - Max Substrat Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSemi Automatic Wafer Bumper consisting of: PC & Monitor Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription: - 6" and 8" Wafer Cassette holder - Wafer Centering Station - Dual End Effector - DI Spray Arm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- PC & Monitor Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Thermo Scientific A25 Chiller - Neslab RTE-221 Chiller - SN: 0350 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Model: NSX-115 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Automated Wafer, Die & Bump Inspection - Objectives: 1, 2, 5, 10, 20x - PC - Monitor - Keyboard and Mouse Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Model: RAD-2500 - SN: D4S2513-1W Year(s) : 1995 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsRAD-2500M/8 - SN: D1S-2584-AQ Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Configured for Top Side Alignment - Includes one Chuck (Customer to Choose Size) - Includes one Maskholder ( Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Topside Alignment (TSA) - Automatic Mask Aligner - Cassette to cassette operation - Can be used in either Au Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Wafer Size: 150mm & 200mm wafer capable - Process: DI water/ozone - Rinse: DI water with ammonium hydroxide Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCurrently Configured for 200mm Wafer Handling Dual Open Cassette Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMax Wafer: 200mm Configuration: Topside Alignment, 350W Lamphouse, UV400 Optics - Topside Alignment - 350W Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Up to 8"/200mm wafer handling - Allows small batch processing for R&D and Pilot Production - Load-locked Sys Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMax Wafer: 200mm System Dimensions: 30x40x66 Weight: 695 lbs - Automatic Surface Inspection System - Bare W Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices