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Used Semiconductor Equipment

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Etcher Type Planar - Magnetron Rated Power Output 4000 Watts Reactor Center Rectangular Reactor Center Size Location : AMERICA North (USA-Canada-Mexico)

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Xray Source Specifications X Ray tube: 47KV @ 1ma Mo anode Beam size: 1.5 Mill/40-45 Micron Resolution: 100 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Chlorine Etch Loadlock Loadloc Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Silicon Etch Bosch Process Loadlo Location : AMERICA North (USA-Canada-Mexico)

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Maximum 100 mm Process Plasma etch Controller Type Microprocessor Controller Type End Point Detection Yes Location : AMERICA North (USA-Canada-Mexico)

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Vacuum System None Vacuum System Chamber made up of the 8" CF 4-way cross, M/N: 600-4T, 304SS 8" CF Door/V Location : AMERICA North (USA-Canada-Mexico)

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Description In-Line Sputtering System Vacuum System Diffusion Pumped Load Lock Included Yes Power Requireme Location : AMERICA North (USA-Canada-Mexico)

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Binocular Angle Variable Eyepieces Model N/A Magnification 16 X Focusing YES Magnification Range Location : AMERICA North (USA-Canada-Mexico)

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Microscope Configuration Brightfield Illumination Type Xe Reflected Light Binocular Angle 60° Eyepieces Location : AMERICA North (USA-Canada-Mexico)

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Polarizer YES Analyzer YES Condenser YES Illumination Power Volts: 6 Watts: 15 Illumination Power Tran Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Set Size 150 mm Microscope Type Stereo Zoom Vacuum Chuck Diameter 6.0000 in (152.4 Location : AMERICA North (USA-Canada-Mexico)

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Illumination Type Coaxial Multiple Objectives Models 2x X-Y-Z Stage Travel X: 25 mm (0.984 in) Y : Location : AMERICA North (USA-Canada-Mexico)

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Description Ozone Generator Power Requirements 220 V 20.0 A 60 Hz 1 Phase Exterior Dimensions Location : AMERICA North (USA-Canada-Mexico)

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Microscope Configuration Brightfield & Darkfield Illumination Type Reflected Light Binocular Angle Variable Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Microscope Configuration Brightfield & Darkfield Illumination Type Reflected Light Binocular Angle Ergonomi Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Rated Power Output 300 Watts Reactor Center Cylindrical Reactor Center Size Depth 12.00 in (30.48 cm) Location : AMERICA North (USA-Canada-Mexico)

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Etcher Type Box Rated Power Output 600 Watts Reactor Center Rectangular Reactor Center Size Width 12.0 Location : AMERICA North (USA-Canada-Mexico)

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Description Analog Manual Wedge Bonder - Leica MZ6 Microscope Accessories Heated/Vacuum Clamp Work Holder Location : AMERICA North (USA-Canada-Mexico)

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Wafer Size Range Minimum 75 mm Maximum 200 mm Set Size 150 mm Process Nitride Etch Controller Type Location : AMERICA North (USA-Canada-Mexico)

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Microscope Type Upright Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected L Location : AMERICA North (USA-Canada-Mexico)

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Eyepieces Model 10447137 Magnification 10 X Field Number 23 mm Focusing YES Magnification Range Location : AMERICA North (USA-Canada-Mexico)

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Binocular Angle 45° Eyepieces Model 10445111 Magnification 2 X Field Number 21 mm Focusing YES Location : AMERICA North (USA-Canada-Mexico)

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Microscope Configuration Brightfield & Darkfield Illumination Type Reflected Light Binocular Angle Variable Location : AMERICA North (USA-Canada-Mexico)

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Microscope Type Upright Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected L Location : AMERICA North (USA-Canada-Mexico)

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Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected & Transmitted Light Binocu Location : AMERICA North (USA-Canada-Mexico)

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You can find used Semiconductor Equipment on Wotol

For second hand Semiconductor Equipment we have Wafer Equipment, Wafer Handler & Robots, CVD Equipment, Wet Bench, Lithography & Photoresist, Plasma Etcher / Asher, Dicer & Scriber, Grinding, Lapping & Polishing, Component Counters/Tapers, Dry Pump, Bonder, Metrology and inspection equipment. The main manufacturers for used Semiconductor Equipment are KLA-Tencor, Plasmatherm, AMAT, TEL, Disco, Karl Suss, Canon, Semitool, Hitachi, Nanometrics, Nikon, Applied Materials, Tegal, Varian.

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