Used Semiconductor Equipment

Max Wafer: 150mm System Dimensions: 36 1/2 x24 1/2 x34 - Manual Wafer Load Mask Aligner - 500W NUV Lamphous Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Long Scan Surface Profilometer - Wafer Size: 8"/200mm - S/N: 1090-0420 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Max Wafer: 200mm System Dimensions: 30x40x66 Weight: 695 lbs - Automatic Surface Inspection System - Bare W Location : AMERICA North (USA-Canada-Mexico)

Price : On request

XRX-X4 X-Ray System Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Up to 8"/200mm wafer capable - Computer controlled - Measures roughness, waviness, step height, and other su Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Fully refurbished to like-new condition, including 1 year warranty, professional installation, and also proce Location : AMERICA North (USA-Canada-Mexico)

Price : On request

<b>1x, KLA-Tencor, 2138XP Surface Inspection System</b> - Currently Setup for Processing 8"/200mm Wafers - L Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Wafer Size 8" Vintage - . Scans samples up to 8 inch . Little or no sample preparation for increased produc Location : ASIA (North East)

Price : On request

System Measurement Performance Spreading Resistance Dynamic Range : 1Ω to > 10Ω Reistivity : 10-⁴~ 4x10⁴Ωcm Co Year(s) : 2004 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator I Year(s) : 2009 Location : ASIA (North East)

Price : On request

■ Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit Year(s) : 2008 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Year(s) : 2005 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

Price : On request

■ Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Auto wafer handling (Genmark robot & pre ali Year(s) : 2004 Location : ASIA (North East)

Price : On request

■ Capable up to 12" Wafer ■ SSM 42 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit Year(s) : 2001 Location : ASIA (North East)

Price : On request

Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers DUV - Vis - NIR: 190nm to 100 Location : ASIA (North East)

Price : On request

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 1996 Location : ASIA (North East)

Price : On request

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 0 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Year(s) : 2006 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

Price : On request

[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator I Year(s) : 2009 Location : ASIA (North East)

Price : On request

- Long Scan Profiler Measurement. - Standard Head with L type stylus. - Scan Length: 210mm. - Scan Speed : 1㎛ Year(s) : 0 Location : ASIA (North East)

Price : On request

Head: Micro Head 5 - sr(13, 65, 327㎛ Range) Lens Objective: Lens:6.4X , Magnification Range:300X~1012X Load Ch Year(s) : 0 Location : ASIA (North East)

Price : On request

- Long Scan Profiler P-11 Measurement. - Micro Head sr with Orange stylus. - Measurement Range: 13㎛,65㎛,327㎛. Year(s) : 1997 Location : ASIA (North East)

Price : On request

- Cassette Handling - Laser: Circumferential(50mW, 405nm), Radial(85mW, 660nm) - Spot size: 5㎛ x 4㎛. - Handler Year(s) : 2012 Location : ASIA (North East)

Price : On request