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Used Semiconductor Equipment

3,405 results
1

■ Capable up to 12" Wafer ■ SSM 42 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit Year(s) : 2001 Location : ASIA (North East)

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Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers DUV - Vis - NIR: 190nm to 100 Location : ASIA (North East)

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*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 1996 Location : ASIA (North East)

Price : On request

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*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 0 Location : ASIA (North East)

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[ General Description ] Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Year(s) : 2006 Location : ASIA (North East)

Price : On request

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[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

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[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator I Year(s) : 2009 Location : ASIA (North East)

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- Long Scan Profiler Measurement. - Standard Head with L type stylus. - Scan Length: 210mm. - Scan Speed : 1㎛ Year(s) : 0 Location : ASIA (North East)

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Head: Micro Head 5 - sr(13, 65, 327㎛ Range) Lens Objective: Lens:6.4X , Magnification Range:300X~1012X Load Ch Year(s) : 0 Location : ASIA (North East)

Price : On request

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- Long Scan Profiler P-11 Measurement. - Micro Head sr with Orange stylus. - Measurement Range: 13㎛,65㎛,327㎛. Year(s) : 1997 Location : ASIA (North East)

Price : On request

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- Cassette Handling - Laser: Circumferential(50mW, 405nm), Radial(85mW, 660nm) - Spot size: 5㎛ x 4㎛. - Handler Year(s) : 2012 Location : ASIA (North East)

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Broadband spectrometry for film thickness and trench profile measurements on photomask reticles. Spotsize: R = Year(s) : 2005 Location : ASIA (North East)

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- Standard Head with L(yellow) type stylus. - Measurement Range: 13㎛,300㎛. - Scan Length: 210mm. - Scan Speed Year(s) : 1995 Location : ASIA (North East)

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Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit ■ Year(s) : 2010 Location : ASIA (North East)

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- Cassette Handling - Laser: Circumferential(50mW, 405nm), Radial(85mW, 660nm) - Spot size: 5㎛ x 4㎛. - Handler Year(s) : 2011 Location : ASIA (North East)

Price : On request

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- Laser: Circumferential(50mW, 405nm), Radial(85mW, 660nm) - Spot size: 5㎛ x 4㎛. - Particle detection: smaller Year(s) : 2011 Location : ASIA (North East)

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*.Measurement -Wafer: 8" -Speed: 5 sec. for 150mm wafer. -Range: 2x10E7 ~ 4x10E7 dyne/cm2 -RMS Noise: 0.0001 m Year(s) : 1993 Location : ASIA (North East)

Price : On request

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Configuration: - Wafer Size : 4 - 8 inch. - Non-patterned surface Inspection System. - 0.1 micron Defect Sensi Year(s) : 1995 Location : ASIA (North East)

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*. Fully refurbished. *. Installed in Clean-room. *. Can demonstrate any time. Wafer Size 8" Location : ASIA (North East)

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Measurement Range : 25?- 20탆 - 500?-200 um with the visible light source (400 to 800nm halogen lamp) - 25?- 50 Year(s) : 2007 Location : ASIA (North East)

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Process: wafer Sheet Resistance measurement *. Measurement perfomance: - 4 Point Probe check surface on Silico Location : ASIA (North East)

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Process: Spreading resistance probe *. Measurement perfomance: - Resistivity and Dopant concentration - Resist Year(s) : 1999 Location : ASIA (North East)

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In-lens Field Emission Scanning Electron Microscope. Imgae Resolution : - 0.4nm guaranteed at accelerating vo Location : ASIA (North East)

Price : On request

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Microscope : - Model :OLYMPUS MX50A-F - Objectives :5X,10X,20X,50X,150X Motorize objectives 2. Autoloader Location : ASIA (North East)

Price : On request

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CS-201- R rotary bin, full off trays All manuals (complete) Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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You can find used Semiconductor Equipment on Wotol

For second hand Semiconductor Equipment we have Wafer Equipment, Wafer Handler & Robots, CVD Equipment, Wet Bench, Lithography & Photoresist, Plasma Etcher / Asher, Dicer & Scriber, Grinding, Lapping & Polishing, Component Counters/Tapers, Dry Pump, Bonder, Metrology and inspection equipment. The main manufacturers for used Semiconductor Equipment are KLA-Tencor, Plasmatherm, AMAT, TEL, Disco, Karl Suss, Canon, Semitool, Hitachi, Nanometrics, Nikon, Applied Materials, Tegal, Varian.

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