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Used Metrology and inspection equipment

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1

Wafer Size 8" Vintage - . Scans samples up to 8 inch . Little or no sample preparation for increased produc Location : ASIA (North East)

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System Measurement Performance Spreading Resistance Dynamic Range : 1Ω to > 10Ω Reistivity : 10-⁴~ 4x10⁴Ωcm Co Year(s) : 2004 Location : ASIA (North East)

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[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator I Year(s) : 2009 Location : ASIA (North East)

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■ Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit Year(s) : 2008 Location : ASIA (North East)

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[ General Description ] Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Year(s) : 2005 Location : ASIA (North East)

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[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

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■ Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Auto wafer handling (Genmark robot & pre ali Year(s) : 2004 Location : ASIA (North East)

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■ Capable up to 12" Wafer ■ SSM 42 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit Year(s) : 2001 Location : ASIA (North East)

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Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers DUV - Vis - NIR: 190nm to 100 Location : ASIA (North East)

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*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 1996 Location : ASIA (North East)

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*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon Year(s) : 0 Location : ASIA (North East)

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[ General Description ] Wafer Size : 2 ~ 6 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator Year(s) : 2006 Location : ASIA (North East)

Price : On request

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[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 25 mW laser, 405 nm wavelength Operator I Year(s) : 2009 Location : ASIA (North East)

Price : On request

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- Long Scan Profiler Measurement. - Standard Head with L type stylus. - Scan Length: 210mm. - Scan Speed : 1㎛ Year(s) : 0 Location : ASIA (North East)

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Head: Micro Head 5 - sr(13, 65, 327㎛ Range) Lens Objective: Lens:6.4X , Magnification Range:300X~1012X Load Ch Year(s) : 0 Location : ASIA (North East)

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- Long Scan Profiler P-11 Measurement. - Micro Head sr with Orange stylus. - Measurement Range: 13㎛,65㎛,327㎛. Year(s) : 1997 Location : ASIA (North East)

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- Cassette Handling - Laser: Circumferential(50mW, 405nm), Radial(85mW, 660nm) - Spot size: 5㎛ x 4㎛. - Handler Year(s) : 2012 Location : ASIA (North East)

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Broadband spectrometry for film thickness and trench profile measurements on photomask reticles. Spotsize: R = Year(s) : 2005 Location : ASIA (North East)

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- Standard Head with L(yellow) type stylus. - Measurement Range: 13㎛,300㎛. - Scan Length: 210mm. - Scan Speed Year(s) : 1995 Location : ASIA (North East)

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- Cassette Handling - Laser: Circumferential(50mW, 405nm), Radial(85mW, 660nm) - Spot size: 5㎛ x 4㎛. - Handler Year(s) : 2011 Location : ASIA (North East)

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- Laser: Circumferential(50mW, 405nm), Radial(85mW, 660nm) - Spot size: 5㎛ x 4㎛. - Particle detection: smaller Year(s) : 2011 Location : ASIA (North East)

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*.Measurement -Wafer: 8" -Speed: 5 sec. for 150mm wafer. -Range: 2x10E7 ~ 4x10E7 dyne/cm2 -RMS Noise: 0.0001 m Year(s) : 1993 Location : ASIA (North East)

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*. Fully refurbished. *. Installed in Clean-room. *. Can demonstrate any time. Wafer Size 8" Location : ASIA (North East)

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Measurement Range : 25?- 20탆 - 500?-200 um with the visible light source (400 to 800nm halogen lamp) - 25?- 50 Year(s) : 2007 Location : ASIA (North East)

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Process: Spreading resistance probe *. Measurement perfomance: - Resistivity and Dopant concentration - Resist Year(s) : 1999 Location : ASIA (North East)

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You can find used Metrology and inspection equipment on Wotol

The main manufacturers of Metrology and inspection equipment are KLA-Tencor, Nanometrics, Rudolph, YESTech, Hitachi, Veeco, Bausch & Lomb, Nikon, Mirtec, Tencor, FEI, Bio-Rad, Prometrix, KLA, Accent Optical, Accretech, ADE, AG Associates, Agilent, Air-Vac, Alcatel, Alessi, Applied Materials, ATG, August Technology, Bruker, Camtek, Canon, Cascade, Cascade Microtech, Cencorp , CR Technology, Cyber Optics, CyberOptics, Dage, Dektak, DNS, Electroglas, Feinfocus, Four Dimensions, Gaertner, Glenbrook, Jeol, Jordan Valley, Karl Suss, Koh Young, Lasertec, Leica, Leitz, Lenz, Mania, Manncorp, Marantz, MDC (Materials Development Corporation), MEK, Micromanipulator, MVP, N&K Technology, Neslab, Nicolet, Nidek, Nordson, Olec, Olympus, Omron, Opti-Probe, Orbotech, Phoenix, Plasmos, Pluritec, Quick, Rigaku, Robotic Visions Systems (RVSI), Rucker & Kolls, Rudolph Research, Saki, SDI Diagnostics, Seiko, Semitool, Signatone, Sloan, Solid State Measurements (SSM), Sonoscan,Suss, T I, TEL, Temptronics, Thermawave, Tokyo Cathode, Tokyo Semitsu Kogaku (TSK), Trio Tech, Varian, Viscom, Vision Engineering, VJ Electronix, Wentworth, Wyko, ZEISS.

The main model SFX200, YTVSeries, 7090CT, VL-M6000, JSM-6060LV, AL3100, AITSeries, SP1-TBI, MVSeries, SST-F-421-280-FK,FE-VII, SCOV-8594, BHMJL, 8840, NSX, FACTS2, 350D, FT-650, PH600HF, SE400adv-16, EZlaze, 680e, S-302-8, 6-axis, α-801D, XRF3640[Handle, FPASeries, S-9380,, eP4, eScan, Viper, CRS1010, SLF576, S27-S-3-1-ML-WP, DFG-840,V200SMicrion,3640, EB700, Alpha-Step, INS3300, CVP-320, 20180122-333, FC-3100, AIT-UV, D3100AFM, Alessi, TPO3020B-2300-1, REL-4100, DEKTAK3ST, V695, 210, I-20, 3577, XT, S2088-ii, M1900, DSeries, LPX, LC361C, BF-Planet, BF-Comet18, CLM, 3630, LEA, Win-Win, YTX-X1, RTX-113HV, AutoInspector, Onyx298, 2033C, MP2020, JWS7500E, AXI-S, Ultrastep, LS-5000, UMA-802-HC551NY, SCW-622-B, XS5-Ⅱ,Analyzer, MV-2HTX, LKX-IRT-2017R2, MX40,020-559.025, Uvision, EpiScan, PLS-600, IS-5, 4400, ES31, 20DXB, IVS, 7600, Swift, SM200, Flexus, 8000, 210, S-8820, 8000x, 4500, 979, UL500, RS35, 4500, S301-4, CD-50-2, 466, S300, 8000, S-8820, UV1250SE, 4150, 210, SM200, 4000, 4500, CD-50-2, RS35, S301-4, 6200,LX22DL-520, PowerSpector,XD7500VR, SK-80BW-BVP, RTP-600xp, TR2400, XD7500VR, FOV200, AT-24AS, 300XP, Onyx29, SP50, F1, XDAL, RD-500, VIS100W, CM460-22, NT8000, 120-1014, FLX2320-S, SDB, Laserplotter, RS, TR2400, 3F5VT-WIN-L3HE-CE, MV-3L(R3), SD-2004,QS-1200, QS-408, 1-124-05, QS-1200,, S-7000, 3640, Magna-IR, QS-300, SZ3060, SD2000, V-12, REL-4500, Optiphot, 3640, QS-408M, S-7000, QSeries, CC-S, Episcan, CC-S, M76, MC2100HE,6000X, RD-500, 5702R, TVP60-GT, SPIRON8800, VT-MUS, Faps60, FAPS, HMW, CCD, MPP, AutoInspector, Triple, Illumia, YTX-X3, 1000, YTX-X3, P12XLM, STK-05W-G-MP550, 465, 9000, M200, 8667, X90, s6055, TS3, M22X, XD760-NT, S9300, S4160, DT-MSM-1030A,RF1, TPO3010B, PH150, CMS3, AFT4000, State, S-5500, State, MX61, MX50A-F, IM-11, WH208, OP2600, LTA-700, P-10, MCV530, Eclips ECO , Archer, AL100-L8,QS-408M, HRP220, P-11, HRP100, NWL641M, Olympus,P-20(H), 7700, Optiphot, P-20(H), Candela, Polyvar, Hisomet-II, MX80F, VIPER, AL100-L8, Reichert, S-4160, IM-14, Archer, 6400F, HSEB, S-5000, VIPER, AL100-L8, P-2, FLX-2908, 3180, Benchtop, Verifast, XD7500, XD7600NT,ACT8, 5100XP,2K, V510, YTV-FX, FLX-2320, SP1, ASET, CTR-200, PowerSpector, YTV-F1, HELIOS, 1010, Strata, 4700-II, 4800-I, XL30, Tecnai, 7000, XL40, Altura, CM200, DA300, 5500, Tecnai, CMSeries, 3000N, 4500, 4700-I,5200, S3088, PZ, M22Xfv-350, i12D, MA6, CB-200, Delta,200, 6420, UltraScan, 6200, P20H, 6220, Surfscan, ST-921R-AA, 2600, C-35, 1007-47, NSX-115, NSX, SherlockSeries, 1300, TP03010B, CM30, Single, VX340, MVP-250, DJ-853V, OP2600, 420, E220, MT7700/7700K, TWINSCAN, maxi, RTX-113, OPL, RMSeries 6100, IIA, CRS1010, P-10, Therm, 200D, FLX-5500, NSX-80,UV-1070, HRP, 3030, MFM65, D9000, NT3300, NT1100, YTV-B3, AXIOTRON, E800, Onyx25XLT, SMZ660, RTX-113, BF-PLANET-XII, FXS-160.40, 2915, 2135, Acrotec, 1001, OP2600, TR6132U, RS35, SM300, TR6133UD, 53-450000-001, U1100, 8100E, 53-450000-001, OP5340, Cougar, SMZ-1B, WST406MG, 7505, ST-495, X8011, L116-C8, ERGULUX, 2132, MHL-525MS, MT2168, DLG.

HS code 9031 40 00 for other machinery from 9031 Measuring or checking instruments, appliances and machines, not specified or included elsewhere in this Chapter; profile projectors. 

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