Allwin21 AW 4450 Sputter ([email protected])

Please visit our website for updated information at www.allwin21.com

Updated Brochure in2024：https://allwin21.com/wp-content/uploads/2024/05/Allwin21-Product-Brochures-Sputtering-Deposition-2024.5-1.pdf

Why Allwin21 AccuSputter AW4450 Sputtering Deposition Eqyupment: https://allwin21.com/wp-content/uploads/2024/05/AccuSputter-AW-4450-Sputtering-Deposition-Equipment.pdf

AW 4450 Sputter
Wafer Size: Small~8 inch
Wafer loading: Manual, with Load Lock
Cathodes: 3xDelta Shape OR 4xCircle Shape
Sputter Methods: RF/DC; Diode/Magnetron
Gas Lines: 1~3 MFCs

Features
Process Proven for III-V substrates
Non-PLC (Smaller footprint / easy maintenance)
20+ years proven sputter technology
New optimum AW-4450 System Control
DC 24V for Motors,Actuator,Relay,Solenoid
Efficient 8″ ,Delta cathodes, 2 to 6″ option
High throughput operation
High Uniformity and Yield
DC, RF Sputter, Pulse DC option
Magnetron and Diode Sputter option
RF Etch and Bias are optional
Ultra Clean vacuum system
Load lock operation
UHV design
Flexible for development or production use
Full range of substrate sizes and shapes
Various pumping and power options
Co-sputtering option


Allwin21 Corp. has been focusing on providing solutions and enhancements to Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480 used sputter deposition semiconductor processequipment. These OEM semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC and new critical components. We rebuild AccuSputter AW 4450 Series Sputter Deposition systems with our own integrated process control system, giving our customers the tools to achieve a production edge at very low cost impact.