6 Allwin21 AW-901eR TTW, AW-903eR TTW - [email protected]
AMERICA North (USA-Canada-Mexico)
Please visit our website for updated information at www.allwin21.com
Updated Brochure in2024：https://allwin21.com/wp-content/uploads/2024/05/Allwin21-Product-Brochures-Plasma-Etcher-2024.5-1.pdf
Why Allwin21 AW-901eR TTW, AW-903eR TTW Semiconductor front end plasma etcher equipment: https://allwin21.com/wp-content/uploads/2024/05/AW-90XeR-Plasma-Etcher-RIE.pdf
Brand: Allwin21 Corp.
Allwin21 Corp. AW-901e TTW Plasma Etch RIE
Wafer Size: 3″ – 6″ Capability
Wafer Loading: 3-axis Robot; Stationary Cassette Plate
Plasma Power: RF 13.56MHz
Type: Parallel/Single Wafer Process; Through-The-Wall (TTW)
Gas Lines: 1-3 Lines
Allwin21 Corp. has been focusing on providing solutions and enhancements to Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 903e TTW used plasma Etch RIE semiconductor process equipment. These OEM Etch RIE semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system (Video) and new critical components to achieve the goal of giving our customers a production edge with right cost.