6 Allwin21 AW-901eR , AW-903eR - [email protected]

Please visit our website for updated information at www.allwin21.com

Updated Brochure in2024：https://allwin21.com/wp-content/uploads/2024/05/Allwin21-Product-Brochures-Plasma-Etcher-2024.5-1.pdf

Why Allwin21 AW-901eR , AW-903eR Semiconductor front end plasma etcher equipment: https://allwin21.com/wp-content/uploads/2024/05/AW-90XeR-Plasma-Etcher-RIE.pdf

Brand: Allwin21 Corp.
Allwin21 Corp. AW-901e Plasma Etch RIE

Wafer Size: 3″ – 6″ Capability
Wafer Loading: 3-axis Robot; Stationary Cassette Plate
Plasma Power: RF 13.56MHz
Type: Parallel/Single Wafer Process; Stand-Alone
Gas Lines: 1-3 Lines

Features:.

PROCESS AND PRODUCTION PROVEN reactor chamber assembly with upper and lower electrode.
Handles 75mm,100mm, 125mm, 150mm Silicon or III-V wafers ,round.
Robotic 3-axis wafer transfer TO PREVENT WAFER BREAKAGE.
4 independent gas line with 4 MFCs (Customized)
Processing of substrate directly on cooled wafer chuck
13.56MHz fully automated RF matching network
ENI ACG-10B 13.56MHz or Equivalent (Water Cooled). Air-Cooled RF Generators are optional.
Accurate, closed-loop pressure control with UPC and MKS Baratron capacitance manometer
Touch screen monitor or LCD Monitor with PC.
New AW-901e Control System from Allwin21 Corp.

Gas flows: settings for up to 4 independent mass flow controller values
RF power: 50 to 1000 watts
Process pressure
Absolute endpoint time
Timed cycles up to 4 hour each
Wafer pins up/down
Optical Endpoint Parameters
Automated calibration of all subsystems
Trouble shooting to subassembly levels
Programmed comprehensive calibration and Built-in diagnostic functions
Recipe creation for full automatic wafer processing
Automatic decline of improper recipes and process data
Multi level pass word protections
Storage of multiple recipes and system functions
Real-Time process data acquisition, display ,analysis
Real-Time graphics display
Process Data and Recipe storage on a hard drive


Allwin21 Corp. has been focusing on providing solutions and enhancements to Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 903e TTW used plasma Etch RIE semiconductor process equipment. These OEM Etch RIE semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system (Video) and new critical components to achieve the goal of giving our customers a production edge with right cost.