Allwin21 AW-2001R ([email protected])

Please visit our website for updated information at www.allwin21.com

Updated Brochure in2024：https://allwin21.com/wp-content/uploads/2024/05/Allwin21-Product-Brochures-Plasma-Etcher-2024.5-1.pdf


Brand: Allwin21
Allwin21 AW-2001R Etcher

Features:
Designed with III-V Production in Mind.
Controller with Touchscreen GUI and PentiumⓇ Grade PC.
The 3-axis wafer transport robot installed:
Superior than Gasonics Aura AE-2001 design that’s synonymous for wafer breakage and constant alarms/errors.
INCREASED THROUGHPUT
Receive cassette station can be substituted with a Cooling/Alignment station to prevent wafer breakage.
NO OBSOLETE PARTS.
Water-Cooled 1000W Magnetron/Waveguide with an AGL Microwave Power Generator for BETTER PROCESS REPEATABILITY.
BETTER UNIFORMITY by using “extended” Alumina Plasma Tube.
Option to run different wafer sizes without any hardware changes.
Specifications:
Wafer Size: 2, 3, 4, 5, 6 inch Capability.
Chuck Temperature: 60-110ºC (±2 ºC)
Gases: NF3 CF4 HE O2
Uniformity:
100mm : ± 3% (5% 3 sigma) *
150mm : ± 5% (8% 3 sigma) *
*max.- min. /2 x average

Allwin21 Corp. has been focusing on providing solutions and enhancements to Gasonics Aura 1000, Gasonics Aura 2000LL, Gasonics Aura 3010, Gasonics L3510 used plasma Asher Descum semiconductor process equipment, Gasonics AE 2001, Gasonics AE 2000LL used Plasma Etcher equipment. These OEM Asher semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system (Video-1000 ; Video-3000/3010/L3510) and new critical components to achieve the goal of giving our customers a production edge with right cost.
Reproducibility (w-t-w): 10% 3 sigma
Particulate: 0.05p/cm2 > 0.3µm
NO DAMAGE: ≤0.1 Volt CV-shift