Nexx Systems Cirrus 300

Description CVD Deposition with ECR source
Wafer Size Range
Minimum 50 mm
Maximum 300 mm
Controller Type PC Controller Type
Loadlock
Loadlock Yes/No YES
High Vacuum Pump Balzers TMH 1001corrosive service Turbo
Automatch Text ASTeX AX3060
Chillers
Number of Chillers 1
Chiller #1Manufacturer/Model Neslab - HX 75
Other Information
PQ2000 Series permanent magnet low profile ECR source.
ASTeX AX2110 microwave power supply with remote magnetron head.
Output 150 - 1000 Watt, PC controlled
20 inch outer diameter reactor chamber with Viton seals.
Six (6) MKS Instruments 2179A Kalrez sealed mass flow controllers, expandable to seven.
Wafer Chuck
Handling up to 300mm in diameter
RF Biased, Via RFPP 1kW, 13.56 Mhz, with automatch
Recirculating fluid cooling
Helium backside cooling
Temperature range -25C to 130C
Mechanical clamp substrate holder
NB: Higher temperatures can be achieved without helium backside cooling
Operating Air Pressure 80.00 PSI (551,624.00 N/sq m)
Condition Excellent
Exterior Dimensions
Width 81.000 in (205.7 cm)
Depth 41.000 in (104.1 cm)
Height 85.000 in (215.9 cm)