Nanometrics

Nanometrics AFT 210UV

* Nanometrics 210UV
* Film Measurement System
* Stage - 4" wafers - larger stage can be supplied
* Range of Thicknesses: 100 to 500,000 angstroms
* Utilizing the UV options you can measure down to appr. 10 Angstroms on certain films
* Spot Size: 50 um with 5x objective, 25 um with 10x
objective, 6.5 um with 40x objective
* Objectives: Olympus MS Plan 5, MS Plan 10, ULWD MS Plan 50
* Optional Objectives are Olympus M5X and M100X
* Film Types: Oxide on Silicon; Nitride on Silicon; Negative
Resist on Silicon; Polysilicon on Oxide; Negative Resist on
Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist
on Silicon; Positive Resist on Oxide