1/1
N&K Technology 3700 RT
ASIA (North East)
N&K 3700 RT Metrology System
Wafer Size 8"
Vintage 2004
Broadband spectrometry for film thickness on transparent substrates, including photomask reticles.
Spotsize: R = 50um, T < 400um
The n&k 3700-RT automated system is designed for handling 5” or 6” square masks or up to 8” square samples.
These systems can also be configured for transparent wafers.
The n&k 3700-RT simultaneously determines thickness, and n and k in the spectral range of 190-1000nm and provide non-destructive, real time, high throughput measurements directly on the device. This system collects reflectance and transmission data (in the spectral range from 190-1000 nm) at the same point and encompasses advanced pattern recognition software, patented microspot measurement technology and a unique all-reflective optical based system.