A-TECH System Ion Milling System

Ion Milling System with Magnetron Sputtering Cathode. Research grade Ion milling system with a single Ion gun and a single 3" RF Magnetron Sputtering Cathode. Previously sputtered Titanium. System has a 4" diameter substrate holder with automated rotation and manual angle adjustment. Computer reads angle and speed. System is mostly manual with some computer interface, monitoring and menu selection. The chamber uses a turbo pump for high vacuum and a manual gate valve. There are MFC gas controllers, Ar 100 sccm, Ar 10 sccm, Kr 10 sccm, Xe 10 sccm.