SDI, Semilab FAaST 230 Non-contact CV/IV Measurement System

Wafer Size 8"
. Up to 8"
. Automatic robotic wafer handling
. Single open-cassette wafer loading station
. Measurement of dielectric and interface properties on monitor wafer
- Dielectric Capacitance (CD) and Thickness (EOT)
- Dielectric Leakage Current (I-V)
- Flatband Voltage (Vfb)
- Interface Trap Density (Dit)
- Interface Trapped Charge (Qit)
- Semiconductor Surface Barrier (Vsb)
- Oxide Total Charge (Qtot)
- Mobile Ionic Charge (Qm), among others
. Suitable for measurement on:
- Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)