Oxford Instruments OPAL ALD Atomic Layer Deposition System

Oxford Instruments OPAL ALD Atomic Layer Deposition System.
The Oxford OpAL is a plasma or thermal assisted atomic layer deposition system ALD.
It is an open loop (non-loadlocked) tool which had two channels for
metal organic precursors, one channe1 for water and a plasma head.

System Overview
Hardware Details
Single open-loop vacuum chamber with heated table and heated sidewalls
8.25" Heated table can run 80-300ºC
Downstream 300 W RF plasma head with isolation valve
Software to run loops of dose/purge cycles to enable ALD
Substrate Requirements
8.25" Diameter circular, flat table.
Substrates must be able to handle 100-250C heating depending on process.
Due to aggressive pumping/purging very small samples or
powders not recommended.
208V, 3Ph, 60Hz, 25A