TEL, Tokyo Electron Expedius

Acid Wet bench
Version: 300 mm
Vintage: 01.10.2006
The EXPEDIUS TM series is
the state-of-the-art cost effective 300mm
wafer cleaning system that
enables 50 wafers maximum processing in
one batch with multiple bath for various chemicals.
EXPEDIUS TM supports not
only conventional wet processes such as
pre-diffusion/oxidation clean,
post-etch clean and resist stripping but
also includes newly developed unique functions to
realize highly selective wet etch of Oxide/Nitride for
3D NAND device manufacturing with
a smaller system footprint and
superior productivity.